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Abstract : This study irradiated the tin oxide membrane deposited on glass floors at a temperature of 450 ° C. The tin was deposited in a vacuum thermal fumigation method. This makes the membrane more homogeneous than the rest of the methods. The results of X-ray analysis showed that the membrane is multi-crystallized and has access to a crystalline system by Miller coefficients. The pure unirradiated sample was found to be the predominant direction. (111) for silicon and higher intensity in addition to Miller's transactions (-120), (102) and (150) and strictly (60 a.u), (12 a.u), (490 a.u) respectively and note that there is a new angle which is 2Ɵ=25.8786 directionally (-120) After irradiation for three days there was an increase in the height of intensity at the 2Ɵ=25.8786 angles 2Ɵ=44.2498 a decrease in the intensity value at the 2Ɵ=59.1840 angle to (340 a.u). The results of the study of the AFM atomic force microscope showed that the surface before irradiation was poles and at irradiation for a full day its shape shifted from peaks to curves subject to caucasian distribution and after the radiation time increased to three days the surface was rearranged into peaks and the rate of nanoscale dimension (17 nm) was 1day irradiation time.

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